D3) Oxide Thin films for Microelectronics

Functional oxide thin films play a pivotal role in advancing microelectronics technologies by enabling new device functionalities and improved performance. These materials exhibit a wide range of properties, including ferroelectricity, piezoelectricity, ion transport, superconductivity, and nonlinear optical responses, making them critical for applications in transistors, photonics, sensors, transducers, and emerging iontronic systems. Recent breakthroughs in the synthesis, characterization, and integration of functional oxide thin films have paved the way for transformative innovations in microelectronics.

This symposium will focus on the latest advances in functional oxide thin films tailored for microelectronic applications. Emphasis will be placed on understanding and engineering their properties through epitaxial growth, defect and strain management, interface engineering, and integration with existing semiconductor platforms. In addition, studies exploring new processing techniques, in situ and operando characterizations, high-throughput experiments, and AI/ML-driven approaches for designing and optimizing oxide thin films will be encouraged.

Abstracts will be solicited from (but not limited to): Experimental and theoretical studies of functional oxide thin films and heterostructures; Novel device architectures utilizing functional oxide materials; Fundamental studies of superconductivity, dielectric, optical, ferroelectric and piezoelectric properties; Integration of oxide thin films with conventional semiconductor platform and emerging two-dimensional materials (e.g. TMDC) and hybrid functional materials (e.g. metal halide perovskites).  

Symposium Topics:

• Precision Epitaxial Synthesis of Functional Oxide Thin Films: Techniques for controlled growth, including pulsed laser deposition, molecular beam epitaxy, and sputtering
• Freestanding oxide membranes: fabrication techniques to prepare freestanding oxide thin film membranes, their emerging functional properties and integration with Si platform
• Ferroelectric, Piezoelectric, and Iontronic Materials: Design and application of materials for energy-efficient memory, logic, and actuation
• Superconductivity: Fundamental mechanisms and applications in superconductive oxide thin films.
• Photonics and Optoelectronic Applications: Oxide thin films for light manipulation, waveguides, and optoelectronic integration
• Oxide Transistors and Next-Generation Devices: Novel channel materials and oxide-based field-effect transistors, integration with 2D materials
• Defect and Strain Engineering in Functional Oxides: Enhancing material performance through controlled defects, strain, and interface modifications
• In Situ and Operando Characterization Techniques: Advanced synchrotron X-ray, neutron scattering, optical spectroscopy, scanning probe and electron microscopy studies to probe materials under working device conditions
• Other functional oxides and advanced devices: magnetic, topological, high-k dielectrics, energy storage, catalysis and electrochemical devices.

This symposium aims to bring together a diverse group of researchers working on oxide thin films and their applications in microelectronics, fostering discussions that will inspire the next wave of technological innovations.